State-of-the-art facilities host high energy near infrared ultrashort pulse lasers that have achieved record performance, advanced thin film growth and characterization and novel nano-metrology that employs  EUV/SXR lasers.

Petawatt-class Ti:Sapphire laser system operating at rep rate up to 3.3 Hz.  Second harmonic beam line provides ultra-high contrast pulses at intensities > 1021 W/cm2.


Chirped pulse amplification Yb:YAG  diode pumped kilowatt average power high pulse energy laser.  

One application of this laser is to pump extreme ultraviolet lasers. 


Ion beam sputtering of thin film amophous oxides.

Optical characterization and spectroscopy of amorphous oxides.

Laser damage testing capabilities.